• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    A method of fabricating a diffraction grating by utilizing a single substrate comprises the steps of forming a photosensitive material layer and a light transmission reducing film having a predetermined pattern integrally with each other on the substrate, exposing the photosensitive material layer by exposure irradiation light via the light transmission reducing film, and developing the photosensitive material layer after exposure. It is composed so that the direction of exposure and the direction of development are opposite to each other. It is possible to fabricate a diffraction grating in which each grating is formed on a predetermined substrate at a predetermined pitch and a root portion in a cross-section of each diffraction grating is constricted. In this way, it is possible to reduce or eliminate interfaces, so that the generation of noise light can be effectively suppressed and a diffraction grating having a high diffraction efficiency can be made.
    公开号:US20010008741A1
    申请号:US09/795,442
    申请日:2001-03-01
    公开日:2001-07-19
    发明作者:Junji Tomita；Fumio Yamagishi
    申请人:Fujitsu Ltd；
    IPC主号:G03F7-201
    专利说明:
    [0001] This application is based upon and claims priority of Japanese Patent Application No. 10-248646, filed Sep. 2, 1998, the contents being incorporated therein by reference, and a continuation of PCT/JP99/03736. [0001] TECHNICAL FIELD OF THE INVENTION
    [0002] The present invention relates to a method of fabricating a diffraction grating and a diffraction grating. [0002] BACKGROUND OF THE INVENTION
    [0003] Conventionally, a diffraction grating is fabricated in such a manner that, for example, as shown in FIG. 1, an optical mask [0003] 5 having a mask substrate 1 and a light shielding film 3 having a predetermined pattern formed on the mask substrate 1, and a resist substrate 11 having a substrate 7 and a resist layer (photosensitive material) 9 formed on the substrate 7, are prepared, respectively, the resist substrate 11 is put on the optical mask 5, and a luminous flux of exposure light (arrows) is vertically irradiated from the optical mask 5 side and after that, development is conducted on the same side as that of exposure.
    [0004] However, since an air layer or a vacuum layer inevitably exist between the light shielding film [0004] 3 and the resist layer 9, noise light is generated by interfacial reflection during the exposure process, and a portion which must not be originally exposed to light is exposed to the noise light. Therefore, it is very difficult to fabricate, for example, a highly accurate diffraction grating, a diffraction grating of a fine profile and a diffraction grating the cross-section of which is oblique. SUMMARY OF THE INVENTION
    [0005] It is an object of the present invention to provide a method of fabricating a diffraction grating capable of effectively suppressing generation of noise light, by reducing or eliminating interfaces. [0005]
    [0006] It is another object of the present invention to provide a diffraction grating having a new cross-sectional shape having a high diffraction efficiency. [0006]
    [0007] In order to solve the above problems, a method of fabricating a diffraction grating by utilizing a single substrate, according to the present invention, comprises the steps of: forming a photosensitive material layer and a light transmission reducing film having a predetermined pattern integrally with each other on the substrate; exposing the photosensitive material layer by exposure to light via the light transmission reducing film; and developing the photosensitive material layer after exposure. [0007]
    [0008] Preferably, the photosensitive material layer is provided on one side of the substrate and the light transmission reducing film is provided on the other side of the substrate. Preferably, the photosensitive material layer and the light transmission reducing film are provided on the same side of the substrate. Preferably, a reflection preventing layer is provided outside the photosensitive material layer. Preferably, a method of fabricating a diffraction grating further comprises the steps of: plating a surface of the photosensitive material layer after development; and fabricating a diffraction grating by utilizing the plated photosensitive material layer as a master grating. Preferably, a method of fabricating a diffraction grating further comprises the steps of: pouring resin onto a surface of the photosensitive material layer after development; curing the poured resin; and removing the cured resin. [0008]
    [0009] A photosensitive substrate, according to the present invention, has a light shielding film having a predetermined pattern formed on one side thereof and a photosensitive material layer formed on the other side thereof. [0009]
    [0010] A further photosensitive substrate, according to the present invention, has a light shielding film having a predetermined pattern formed on one side thereof and a photosensitive material layer formed on the light shielding film. [0010]
    [0011] A diffraction grating is formed parallel to and on a predetermined substrate at a predetermined pitch, according to the present invention, wherein a root portion of each diffraction grating in cross-section is constricted. [0011]
    [0012] Preferably, in cross-section of each diffraction grating, a portion from the root to the forward and is entirely oblique. Preferably, in cross-section of each diffraction grating, a forward end portion is formed into a profile in which rectangles are overlapped. [0012] BRIEF DESCRIPTION OF THE DRAWINGS
    [0013] The present invention will become more apparent from the following description of the preferred embodiment taken in connection with the accompanying drawings, in which: [0013]
    [0014] FIG. 1 is a view showing a method of fabricating a conventional diffraction grating; [0014]
    [0015] FIG. 2A is a view showing an exposure process relating to the first embodiment of the present invention; [0015]
    [0016] FIG. 2B is a view showing a development process of the optical mask of FIG. 2A; [0016]
    [0017] FIG. 3 is a view showing an exposure process relating to the second embodiment of the present invention; [0017]
    [0018] FIG. 4A is a view showing a process for obliquely exposing by using the optical mask of the first embodiment; [0018]
    [0019] FIG. 4B is a view showing a development process for developing the optical mask of FIG. 4A; [0019]
    [0020] FIG. 5 is a view showing a process for obliquely exposing using the optical mask of the second embodiment; [0020]
    [0021] FIG. 6 is a view showing a process for obliquely exposing using a prism; [0021]
    [0022] FIG. 7 is a view showing an arrangement in which a light absorption layer is provided; [0022]
    [0023] FIG. 8 is a view showing an arrangement in which a reflection preventing film is provided; [0023]
    [0024] FIG. 9 is a view showing an exposure process using an optical mask having a thick light shielding film; [0024]
    [0025] FIG. 10 is a view showing a state in which a diffraction grating having deep grooves is fabricated; [0025]
    [0026] FIG. 11 is a view showing a replica of a diffraction grating; [0026]
    [0027] FIG. 12 is a view showing a substrate having a thick light shielding film; [0027]
    [0028] FIG. 13 is a view showing a substrate having deep grooves; [0028]
    [0029] FIG. 14 is a view showing a diffraction grating having a new cross-sectional shape; [0029]
    [0030] FIG. 15 is a view showing a diffraction grating having another new cross-sectional shape; [0030]
    [0031] FIG. 16 is a view showing a diffraction grating having still another new cross-sectional shape; and [0031]
    [0032] FIG. 17 is a view showing a diffraction grating having still another new cross-sectional shape. [0032] BEST MODE FOR CARRYING OUT THE INVENTION
    [0033] Referring to the accompanying drawings, a plurality of embodiments of the present invention will be explained below. [0033]
    [0034] FIG. 2A is a view showing an exposure process relating to the first embodiment of the present invention. In FIG. 2A, an optical mask [0034] 21 is composed in such a manner that a light shielding film (light transmission reducing film) 25 having a predetermined pattern is formed on one side (upper side in the drawing) of a single mask substrate 23 made of, for example, quartz glass which less absorbs ultraviolet rays. In this connection, the light shielding film 25 is a metallic film, which is made of metal such as chromium, chromium oxide, aluminum, titanium, nickel, silver and gold, capable of reducing transmission of a light, and the optical mask 21 is made in such a manner, for example, that a metallic film is vapor-deposited on the mask substrate 23, a resist layer is formed on the metallic film, electron beam (EB) drawing is conducted, and the metallic film is etched after development.
    [0035] On the opposite side (lower surface in the drawing) of the mask substrate [0035] 23, a resist layer (photosensitive material layer) 27 is integrally formed. In this connection, the resist layer 27 can be composed of either the positive type resist material or the negative type resist material.
    [0036] A flux of exposure light (arrows) is irradiated from the side of the light shielding film [0036] 25 of the optical mask 21 to expose the resist layer 27. As shown in FIG. 2B, after the exposure, the optical mask 21 is developed, and a diffraction grating 28 is fabricated.
    [0037] In this embodiment, in which the light shielding film [0037] 25 and the resist layer 27 are formed tightly and integrally with the mask substrate 23, an air layer or a vacuum layer are not interposed between the light shielding film 25 and the resist layer 27, compared with the conventional structure in which the resist substrate 11 (having the resist layer 9) and the mask substrate 1 (having the light shielding film 3) are arranged close to each other, and further the dimension between the light shielding film 25 and the resist layer 27 can be made uniform with high accuracy. Accordingly, it is possible to suppress the generation of noise light, the fabrication accuracy of the diffraction grating 28 can be enhanced, and the yield can be improved in the manufacturing process.
    [0038] FIG. 3 is a view showing an exposure process relating to the second embodiment of the present invention. In FIG. 3, the optical mask [0038] 31 is composed in such a manner that the resist layer 37 is integrally formed on the same side (lower surface) of the mask substrate 33 as the side on which the light shielding film 35 is formed and overlapped with the light shielding film 35. After exposure, development is conducted, and it is possible to fabricate a diffraction grating which is similar to the diffraction grating of FIG. 2B. In this embodiment having the arrangement in which the light shielding film 35 and the resist layer 37 are integrated with each other (without interposing the mask substrate between them), the light shielding film 35 and the resist layer 37 are directly attached to each other, so deterioration of resolution can be reduced, and a highly accurate diffraction grating can be fabricated.
    [0039] Here, interfacial reflectance in the arrangement in which the mask substrate (or the resist substrate) [0039] 33 is used (FIG. 3) and interfacial reflectance in the conventional arrangement (the combination of the optical mask 5 and the resist substrate 11 in FIG. 1) are experimentally compared with each other, and the result thereof will be briefly explained below.
    [0040] In the conventional arrangement, the interfacial reflectance between the mask substrate [0040] 1 and the air layer is 4.0%, and the interfacial reflectance between the resist layer 9 and the air layer is 5.3%, so the ray of exposure light is subjected to multiple reflection in the air layer and the resolution is extremely deteriorated, and after all, it is difficult to fabricate a highly accurate diffraction grating.
    [0041] On the other hand, in the arrangement of this embodiment of FIG. 3, interfacial reflectance between the mask substrate [0041] 33 and the resist layer 37 is 0.1%, so it will be understood that the deterioration of resolution is remarkably suppressed, compared with the conventional arrangement.
    [0042] When the optical mask [0042] 21 or 31 relating to the first or second embodiment is used, it is possible to fabricate a diffraction grating having an oblique cross-sectional shape, by irradiating a flux of exposure light at a predetermined incident angle (θ), as shown in FIGS. 4A and 5. For example, FIG. 4B shows a diffraction grating 29 which is obtained by developing the optical mask 21 after the exposure of it shown in FIG. 4A. When developing is conducted by using the optical mask 31 shown in FIG. 5, a similar diffraction grating to that described above can be obtained. The oblige irradiation can be carried out by an exposure device which is on the market but is specially remodeled, but it can be easily and conveniently carried out by arranging for example, a certain prism 39 on the mask substrate 33, as shown in FIG. 6.
    [0043] In this connection, there is a possibility that a ray of light transmitting through the resist layer [0043] 27 or 37 in the exposure process is reflected by the surface of the resist layer so that noise light is generated which deteriorates the manufacturing accuracy of the diffraction grating. Means for avoiding the occurrence of the above problem is shown in FIG. 7 in which the countermeasure is applied to the optical mask 21 of FIG. 2. Referring to FIG. 7, there is provided a reflection preventing layer on the surface (lower surface) of the resist layer 27; as an example, there is provided a light absorbing layer 41 (comprising a photosensitive material or an oil-based material (for example, oil ink)). More practically, in order to make the light absorbing layer 41 easily removed and separated in the later process, there is provided a mixing prevention layer 43 (for example, made of aqueous polyvinyl alcohol) between the light absorbing layer 41 and the resist layer 27.
    [0044] As another example of the reflection preventing layer, it is possible to form a light transmitting film capable of reducing reflection on the surface of the resist layer, that is, it is possible to form a reflection preventing film. An arrangement in which this is applied to, for example, the optical mask [0044] 21 of FIG. 2A is shown in FIG. 8. A reflection preventing film 45 is made of polyvinyl alcohol, for example, and the reflection preventing effect can be provided by controlling the film thickness so as to have a thickness of ¼λ of the wavelength of exposure light, for example.
    [0045] The diffraction gratings [0045] 28 and 29 obtained by the above embodiments can be also used as an original of a diffraction grating. In this case, a metallic stamper is made in such a manner that an electrode film is formed on the surface of the diffraction grating by means of vapor-deposition or the like and then plating is conducted. By using this stamper or a stamper made by duplicating this stamper, it is possible to fabricate a large number of replicas of the diffraction grating at low cost.
    [0046] As a specific method of duplicating the diffraction grating, for example, there are following methods: (1) An injection molding method in which thermally reversible resin is poured onto a surface (relief) of the stamper, and is cured, and then the resin is separated from the mold, to thereby fabricate a replica of the diffraction grating; and (2) 2P method in which ultraviolet ray curable resin is poured onto a surface of the stamper, a transfer substrate (glass) is put on it, ultraviolet ray is irradiated through the transfer substrate so as to cure the resin, and the resin is separated together with the transfer substrate from the mold to thereby fabricate a replica of the diffraction grating. In this connection, in this 2P method, it is possible to change the process in such a manner that ultraviolet ray curable resin is poured onto the transfer substrate and the diffraction grating original is put on this transfer substrate. [0046]
    [0047] It is possible to directly fabricate a replica of a diffraction grating from the original of the diffraction grating, instead of fabricate (a replica of) a diffraction grating using the stamper. In this case, it is possible to fabricate (duplicate) a more highly accurate and faithful diffraction grating, and the method of duplicating a diffraction grating is fundamentally similar to that made by the stamper. [0047]
    [0048] In the above 2P method, duplication is conducted by using the transfer substrate (glass), but instead of using the transfer substrate, in order to reduce the manufacturing cost, it is possible to directly transfer and duplicate a diffraction grating to a certain member in which the diffraction grating is formed. That is, a diffraction grating is formed as follows: Ultraviolet ray curable resin is directly poured onto a surface (relief) of the above original of the diffraction grating, a certain member is put on it, then ultraviolet rays are irradiated from the side of the original of the diffraction grating so as to cure the resin, and after that, the original of the diffraction grating is separated to thereby fabricate the diffraction grating. Due to the foregoing, it is possible to easily make a reflection type surface relief diffraction grating, for example, it is possible to directly make a diffraction grating on an aluminum vapor-deposited mirror. In this connection, it is possible to change the processes in such a manner that ultraviolet ray curable resin is poured onto a certain member and the original of the diffraction grating is put on it. [0048]
    [0049] In this original of the diffraction grating, after the completion of the process of transfer, duplication and mold-separation, the diffraction grating made of resist is inevitably damaged, but the light shielding film and mask substrate are less damaged. Therefore, the resist layer (diffraction grating) of the original of the diffraction grating can be reused (recycled) as an optical mask (light shielding mask and mask substrate), by removing and cleaning the resist layer (diffraction grating) of the original of the diffraction grating and this is very reasonable and economical. [0049]
    [0050] In this connection, it is well known that the deeper the grooves, the higher the diffraction efficiency of a diffraction grating. Therefore, in order to obtain a diffraction grating having deep grooves, it is considered to simply increase the thickness of a resist layer, but the thickness of the resist layer is limited due to the characteristics of a ray of exposure light. Accordingly, in general, it is difficult to fabricate a diffraction grating or a duplicated diffraction grating having desired deep grooves. [0050]
    [0051] However, by using a thick light shielding film [0051] 35′ in the arrangement shown in FIG. 9, it is possible to fabricate a diffraction grating G1 (made of the resist) having deep grooves as shown in FIG. 10. Further, by using this diffraction grating G1 as an original, it is possible to fabricate (a replica of) a diffraction grating G2 having deep grooves shown in FIG. 11.
    [0052] After all, the light shielding film takes a part in the formation of the grooves, and it can be said that the sum of the thickness of the light shielding film and the depth of the resist grooves corresponds to the depth of the grooves of the diffraction grating. Accordingly, from the theoretical viewpoint, by setting and controlling the thickness of the light shielding film, it is possible to fabricate a diffraction grating or a replica of a diffraction grating, having very deep grooves, which could not be considered in the prior art. [0052]
    [0053] An example of forming an optical mask having such a thick light shielding film will be explained below. For example, this is a method, as shown in FIG. 12, in which a metallic film (light shielding film) [0053] 53, the thickness of which is 1000 Å, is vapor-deposited on a quartz substrate 51, a resist layer is formed on this metallic film 53, electron beam (EB) drawing is then conducted, and the metallic film 53 is etched after etching. However, according to this forming method, when it is designed to form a thick metallic film, there is a possibility that the etching time is increased and the resist layer is damaged, and therefore, a method can be adopted in which the thickness of the metallic film to be vapor-deposited is appropriately adjusted and the metallic film (light shielding film) is made to grow by means of plating, to thereby form a thick light shielding film.
    [0054] Instead of forming a thick light shielding film, it is possible to provide the same function as that of the thick light shielding film, by forming a light shielding film of an appropriate thickness and causing portions of the light shielding film to protrude (in other words, causing portions except for portions of the light shielding film to sink). That is, for example, as shown in FIG. 13, it is possible to form an optical mask (optical mask having step portions) having deep grooves [0054] 65, by vapor-depositing a metallic film (light shielding film) 63 on a quartz substrate 51, forming a resist pattern by exposure and development, forming a light shielding film having a predetermined pattern by dry etching method using reaction gas, and etching the quartz substrate 51, for example, by freon reaction gas. In this way, the optical mask can be formed. By using this optical mask, it is possible to fabricate a diffraction grating having deep grooves in the same manner as that of the optical mask having a thick light shielding film.
    [0055] Finally, several examples of the profile of the diffraction grating capable of being formed according to the present invention will be explained below. [0055]
    [0056] In the conventional process, the direction of exposure and that of development with respect to the resist layer are the same, but, in the process of this embodiment, the direction of exposure and that of development are opposite to each other. According to this characteristics and also according to the characteristics that the resist layer and the light shielding film are integrated with each other on one substrate, it is possible to fabricate not only a diffraction grating of a triangular shape, a saw-tooth shape, a rectangular shape, a sinusoidal shape or a half sinusoidal wave shape, but also for example, a diffraction grating having a new and remarkable cross-sectional shape, provided on a certain substrate [0056] 71, as shown in FIGS. 14 to 17. In these views, for example, the angles are set as follows:
    [0057] Every diffraction grating is characterized in that the profile is formed into a reverse trapezoid and the root portion is constricted. Diffraction grating G[0057] 4 of FIG. 15 has a cross-sectional shape which is formed in such a manner that a rectangle is added to a diffraction grating G3 of FIG. 14. Diffraction grating G5 of FIG. 16 has a cross-sectional shape which is formed in such a manner that a diffraction grating G3 of FIG. 14 is further inclined, and the diffraction grating G8 of FIG. 17 has a cross-sectional shape which is formed in such a manner that a diffraction grating G4 (except for the rectangular portion) of FIG. 15 is further inclined.
    [0058] In the cases of these diffraction gratings G[0058] 3 to G6 having the cross-sectional shapes in a reverse trapezoid, it is possible to provide a high diffraction efficiency, and it is difficult to duplicate the diffraction gratings, in other words, it is difficult to forge the diffraction gratings, and therefore, they are advantageous and very preferable.
    [0059] As explained above, according to the present invention, it is possible to effectively suppress the generation of noise light by reducing or eliminating interfaces, and it is possible to fabricate a diffraction grating having a high diffraction efficiency. [0059]
    权利要求:
    Claims (11)
    [1" id="US-20010008741-A1-CLM-00001] 1. A method of fabricating a diffraction grating by utilizing a single substrate, said method comprising the steps of:
    forming a photosensitive material layer and a light transmission reducing film having a predetermined pattern integrally with each other on the substrate;
    exposing the photosensitive material layer by exposure irradiation light via the light transmission reducing film; and
    developing the photosensitive material layer after exposure.
    [2" id="US-20010008741-A1-CLM-00002] 2. A method of fabricating a diffraction grating according to
    claim 1 , wherein the photosensitive material layer is provided on one side of the substrate and the light transmission reducing film is provided on the other side of the substrate.
    [3" id="US-20010008741-A1-CLM-00003] 3. A method of fabricating a diffraction grating according to
    claim 1 , wherein the photosensitive material layer and the light transmission reducing film are provided on the same side of the substrate.
    [4" id="US-20010008741-A1-CLM-00004] 4. A method of fabricating a diffraction grating according to
    claim 1 , wherein a reflection preventing layer is provided outside the photosensitive material layer.
    [5" id="US-20010008741-A1-CLM-00005] 5. A method of fabricating a diffraction grating according to
    claim 1 , further comprising the steps of:
    plating a surface of the photosensitive material layer after development; and
    fabricating a diffraction grating by utilizing the plated photosensitive material layer as a master grating.
    [6" id="US-20010008741-A1-CLM-00006] 6. A method of fabricating a diffraction grating according to
    claim 1 , further comprising the steps of:
    pouring resin onto a surface of the photosensitive material layer after development;
    curing the poured resin; and
    removing the cured resin.
    [7" id="US-20010008741-A1-CLM-00007] 7. A photosensitive substrate having a light shielding film having a predetermined pattern formed on one side thereof and a photosensitive material layer formed on the other side thereof.
    [8" id="US-20010008741-A1-CLM-00008] 8. A photosensitive substrate having a light shielding film having a predetermined pattern formed on one side thereof and a photosensitive material layer formed on the light shielding film.
    [9" id="US-20010008741-A1-CLM-00009] 9. A diffraction grating formed on a predetermined substrate in parallel at a predetermined pitch, wherein a root portion of each diffraction grating in cross-section is constricted.
    [10" id="US-20010008741-A1-CLM-00010] 10. A diffraction grating according to
    claim 9 , wherein in cross-section of each diffraction grating, a portion from the root to the forward end is entirely oblique.
    [11" id="US-20010008741-A1-CLM-00011] 11. A diffraction grating according to
    claim 9 , wherein in cross-section of each diffraction grating, a forward end portion is formed into a profile in which rectangles are overlapped.
    类似技术:
    公开号 | 公开日 | 专利标题
    US6723474B2|2004-04-20|Method of fabricating diffraction grating and diffraction grating
    US7018783B2|2006-03-28|Fine structure and devices employing it
    KR101095681B1|2011-12-19|Photomask for extreme ultraviolet lithography and method for fabricating the same
    US7758791B2|2010-07-20|Find mold and method for regenerating fine mold
    JP2837816B2|1998-12-16|Lithography exposure mask manufacturing method
    US5245470A|1993-09-14|Polarizing exposure apparatus using a polarizer and method for fabrication of a polarizing mask by using a polarizing exposure apparatus
    JPH0659435A|1994-03-04|Mask and manufacture thereof
    CN1575437A|2005-02-02|Method for obtaining elliptical and rounded shapes using beam shaping
    US20050232130A1|2005-10-20|Production method for photoresist master, production method for optical recording medium-producing stamper, stamper, phtoresist master, stamper intermediate element and optical recroding medium
    US6569608B2|2003-05-27|Method of manufacturing an element with multiple-level surface
    US7592129B2|2009-09-22|Method for forming photoresist pattern and method for manufacturing semiconductor device
    KR100630728B1|2006-10-02|Reflection photomask, fabricating method of the same
    CA2221723C|2000-08-29|Optical card
    EP1096312B1|2008-12-24|Non absorbing reticle and method of making same
    JPH07174902A|1995-07-14|Microlens array and its production
    JP3321194B2|2002-09-03|Photo mask
    JP2704938B2|1998-01-26|Method of manufacturing mask for pattern formation of semiconductor element
    US5635335A|1997-06-03|Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask
    EP1081551B1|2007-10-24|Method of manufacturing a two-dimensional phase element
    JPH1130711A|1999-02-02|Diffraction optical element and its manufacture, and optical equipment
    JPH09274425A|1997-10-21|Hologram element and its production
    JP2004354537A|2004-12-16|Method for manufacturing master model for manufacture of fine structural body, master model for manufacture of fine structural body, and fine structural body
    JP3341403B2|2002-11-05|Reflection mask and method of manufacturing the same
    US5576122A|1996-11-19|Phase shift mask and manufacturing method thereof
    JPH07121913A|1995-05-12|Stamper for producing optical disk and manufacture thereof
    同族专利:
    公开号 | 公开日
    JP2000075117A|2000-03-14|
    JP3877444B2|2007-02-07|
    US6723474B2|2004-04-20|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20050058948A1|2003-09-11|2005-03-17|Freese Robert P.|Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced|
    US20050058947A1|2003-09-11|2005-03-17|Rinehart Thomas A.|Systems and methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam|
    WO2006059030A1|2004-12-02|2006-06-08|Commissariat A L'energie Atomique|Improved photolithography device and method for producing patterns with sloped edges|
    US20070003868A1|2003-09-11|2007-01-04|Bright View Technologies, Inc.|Systems and methods for fabricating blanks for microstructure masters by imaging a radiation sensitive layer sandwiched between outer layers, and blanks for microstructure masters fabricated thereby|
    WO2007057500A1|2005-11-18|2007-05-24|Nanocomp Oy Ltd|Method of producing a diffraction grating element|
    US20080038916A1|2006-07-18|2008-02-14|Interuniversitair Microelektronica CentrumVzw|Method for the production of planar structures|
    US9480447B2|2010-06-17|2016-11-01|Karlsruher Institut Fuer Technologie|Inclined phase grating structures|
    US20170248758A1|2014-12-18|2017-08-31|Gigaphoton Inc.|Grating, method for manufacturing grating, and method for recycling grating|JPH0217002B2|1983-08-05|1990-04-19|Kogyo Gijutsuin||
    US4948706A|1987-12-30|1990-08-14|Hoya Corporation|Process for producing transparent substrate having thereon transparent conductive pattern elements separated by light-shielding insulating film, and process for producing surface-colored material|
    JPH06201909A|1992-12-28|1994-07-22|Canon Inc|Production of diffraction grating|
    US5712065A|1995-04-27|1998-01-27|Industrial Technology Research Institute|Process for fabricating a multicolor filter|
    JPH08334610A|1995-06-06|1996-12-17|Furukawa Electric Co Ltd:The|Production of diffraction grating|
    US6280642B1|1996-06-04|2001-08-28|Citizen Watch Co., Ltd.|Ink jet head and method of manufacturing same|
    JPH10106047A|1996-10-01|1998-04-24|Sony Corp|Production of optical recording medium|
    US5786116A|1997-02-14|1998-07-28|Micron Technology, Inc.|Atom lithographic mask having diffraction grating aligned with primary mask pattern|KR100350489B1|2000-07-14|2002-08-28|삼성전자 주식회사|Fabrication apparatus for gain flattening filter using a optical attenuator|
    US20070148558A1|2005-12-27|2007-06-28|Shahzad Akbar|Double metal collimated photo masks, diffraction gratings, optics system, and method related thereto|
    JP2008159694A|2006-12-21|2008-07-10|Shinko Electric Ind Co Ltd|Manufacturing method of electronic component|
    JP5380988B2|2008-09-30|2014-01-08|凸版印刷株式会社|Optical element|
    CN108761616B|2018-03-23|2020-10-16|中国科学院上海光学精密机械研究所|Multi-band high-reflection flexible wave plate and preparation method thereof|
    法律状态:
    2001-03-01| AS| Assignment|Owner name: FUJITSU LIMITED, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TOMITA, JUNJI;YAMAGISHI, FUMIO;REEL/FRAME:011576/0280 Effective date: 20010222 |
    2007-09-17| FPAY| Fee payment|Year of fee payment: 4 |
    2011-09-14| FPAY| Fee payment|Year of fee payment: 8 |
    2015-11-27| REMI| Maintenance fee reminder mailed|
    2016-04-20| LAPS| Lapse for failure to pay maintenance fees|
    2016-05-16| STCH| Information on status: patent discontinuation|Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
    2016-06-07| FP| Expired due to failure to pay maintenance fee|Effective date: 20160420 |
    优先权:
    申请号 | 申请日 | 专利标题
    JP10-248646||1998-09-02||
    JP24864698A|JP3877444B2|1998-09-02|1998-09-02|Diffraction grating|
    JPPCT/JP99/03736||1999-07-09||
    [返回顶部]